Alex Frenzel (ASML)
Extreme Ultraviolet Light Source and Research at ASML
ASML is the leading supplier to the semiconductor industry, driving lithography system innovation to make chips smaller, faster and greener. EUV lithography, a technology entirely unique to ASML, uses light with a wavelength of 13.5 nanometers. In San Diego, ASML focuses on the R&D and manufacturing of extreme ultraviolet (EUV) light sources for lithography systems, which are used to make microchips. In this presentation, we provide an overview of tin laser-produced-plasma (LPP) extreme-ultraviolet (EUV) sources at 13.5nm.
Alex works in Technology Development at ASML San Diego, where he has investigated ion and radiation generation in the EUV source, and currently performs research in plasma debris mitigation. He earned his PhD in physics at Harvard University in 2015 and his BS in physics at UC San Diego in 2009